The CYSI CVD Tube Furnace for metal film deposition uses controlled thermal decomposition or reduction of metal-organic precursors to deposit tungsten, molybdenum, titanium, and other refractory metal thin films inside the quartz or alumina process tube. With a 4-channel MFC gas delivery system and optional vacuum pumping, it supports both atmospheric CVD and low-pressure CVD (LPCVD) processes for semiconductor, MEMS, and energy device applications.
Specifications
| Parameter | Value / Details |
|---|
| Product Model | CY-CVD-1200-Metal |
| Maximum Temperature | 1200 °C |
| Temperature Uniformity | ± 1 °C in uniform zone |
| Tube Material | Quartz (standard) / Alumina (> 1100 °C) |
| Tube Inner Diameter | 50 mm / 60 mm / 80 mm (selectable) |
| Heating Zones | 1 / 2 / 3 (selectable) |
| Gas Lines | 3–4 channels with MFC (H₂, Ar, N₂, precursor carrier) |
| Vacuum Option | Rotary pump for LPCVD — down to 10 Pa |
| Temperature Controller | PID — 30-segment programmable |
| Heating Rate | Up to 25 °C/min |
| Deposited Films | W, Mo, Ti, TiN, TiC, WS₂, MoS₂, metal carbides |
| Safety Features | Gas leak alarm, over-temperature protection |
| Supply Voltage | AC 220 V / 50 Hz |
| Total Power | ≈ 3 kW |
| Applications | Metal gate electrodes, MEMS, hard coatings, 2D material growth |
Trade Information
| Trade Detail | Information |
|---|
| Minimum Order Quantity | 1 Unit |
| Supply Ability | 4 Units Per Month |
| Delivery Time | 3–8 Weeks |
| Main Domestic Market | China |
| Export Markets | Worldwide |
| Payment Terms | T/T, L/C, Western Union, PayPal |
| Packaging | Wooden crate with foam-padded export packing |
| Warranty | 12 Months from date of commissioning |
| After-Sales Service | Online technical support + on-site service available |
| Customization | Available on request |
