CYSI horizontal high-vacuum three-target magnetron sputtering coater for alloy, multi-layer, and composite thin film deposition with independent DC/RF power supplies, substrate heater, and high-speed turbo pump.
The CYSI Horizontal High Vacuum Three-Target Magnetron Sputtering Coater supports simultaneous or sequential three-material deposition in a horizontal chamber configuration, enabling the fabrication of alloy films, functionally graded coatings, and precise multi-layer stacks. Independent shutters for each target, programmable process control, and a substrate heater ensure repeatable film composition and crystal structure across a wide range of metal, oxide, and nitride material systems.
| Parameter | Value / Details |
|---|---|
| Number of Targets | 3 (three target — horizontal arrangement) |
| Power Supply | Independent DC/RF per target |
| Target Size | 2-inch or 3-inch (configurable) |
| Vacuum System | High-speed turbomolecular pump |
| Base Pressure | ≤ 5.0 × 10⁻⁴ Pa |
| Substrate Heater | Integrated — temperature controllable |
| Process Gas | Ar, N₂, O₂ via MFC |
| Applications | Alloy films, nitrides, oxides, multi-layer coatings |
| Trade Detail | Information |
|---|---|
| Minimum Order Quantity | 1 Unit |
| Supply Ability | 4 Units Per Month |
| Delivery Time | 1–16 Weeks |
| Main Domestic Market | China |
| Export Markets | Worldwide |
| Payment Terms | T/T, L/C, Western Union, PayPal |
| Packaging | Wooden crate with foam-padded export packing |
| Warranty | 12 Months from date of commissioning |
| After-Sales Service | Online technical support + on-site service available |
| Customization | Available on request |
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