CYSI high-vacuum 4-inch three-target magnetron sputtering coater for silicon carbide (SiC), nitride, and oxide thin film deposition on 4-inch substrates with independent RF/DC power and substrate bias capability.
The CYSI High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater is engineered for 4-inch substrate thin film deposition of silicon carbide (SiC), silicon nitride, and other hard ceramic films. The three independent target stations with RF and DC power options support reactive sputtering in Ar/N₂/O₂ mixed gas environments, while the substrate bias option enables dense, well-adhered film growth ideal for semiconductor device fabrication and wear-resistant coating research.
| Parameter | Value / Details |
|---|---|
| Substrate Size | 4 inches (100 mm) |
| Number of Targets | 3 (independent DC/RF) |
| Target Size | 3-inch (76.2 mm) |
| Vacuum System | High-vacuum turbomolecular pump |
| Base Pressure | ≤ 5.0 × 10⁻⁴ Pa |
| Process Gas | Ar, N₂, O₂ (MFC controlled) |
| Substrate Bias | Optional RF bias |
| Applications | SiC film, Si₃N₄, Al₂O₃, hard coatings, semiconductor films |
| Trade Detail | Information |
|---|---|
| Minimum Order Quantity | 1 Unit |
| Supply Ability | 4 Units Per Month |
| Delivery Time | 1–16 Weeks |
| Main Domestic Market | China |
| Export Markets | Worldwide |
| Payment Terms | T/T, L/C, Western Union, PayPal |
| Packaging | Wooden crate with foam-padded export packing |
| Warranty | 12 Months from date of commissioning |
| After-Sales Service | Online technical support + on-site service available |
| Customization | Available on request |
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