CYSI downward-mounted four-target magnetron sputtering coater designed for coating powder substrates and diamond particles with metal or compound thin films via uniform downward sputter flux configuration.
The CYSI Downward-Mounted Four-Target Magnetron Sputtering Coater features an innovative downward-facing target configuration that delivers uniform sputter flux directly onto powder bed or particulate substrates, including diamond particles and micron-scale powders. Four independent targets allow multi-element co-deposition or sequential layer coating with precise control over film composition and thickness for advanced composite powder applications.
| Parameter | Value / Details |
|---|---|
| Number of Targets | 4 (downward-mounted configuration) |
| Target Orientation | Facing downward — optimised for powder substrates |
| Power Supply | Independent DC/RF per target |
| Target Size | 2-inch (standard) |
| Vacuum System | Turbomolecular pump |
| Base Pressure | ≤ 5.0 × 10⁻⁴ Pa |
| Applications | Diamond coated powder, composite particles, metal-coated powder |
| Trade Detail | Information |
|---|---|
| Minimum Order Quantity | 1 Unit |
| Supply Ability | 4 Units Per Month |
| Delivery Time | 1–16 Weeks |
| Main Domestic Market | China |
| Export Markets | Worldwide |
| Payment Terms | T/T, L/C, Western Union, PayPal |
| Packaging | Wooden crate with foam-padded export packing |
| Warranty | 12 Months from date of commissioning |
| After-Sales Service | Online technical support + on-site service available |
| Customization | Available on request |
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