CYSI desktop dual-target DC/RF magnetron sputtering coater with stainless steel cavity for chromium and multi-material film deposition on wafers, with rotating heated stage and high-vacuum turbomolecular pump system.
The CYSI Desktop Double Target Magnetron Sputtering Coater provides dual-target capability in a compact stainless steel chamber, enabling co-sputtering, alloy film deposition, or sequential multi-material coating in a single pumpdown. Specifically optimised for chromium (Cr) deposition on silicon and other wafer substrates, the system features independent target shutters, a rotating heated sample stage, and a turbomolecular pump system for consistent high-vacuum performance.
| Parameter | Value / Details |
|---|---|
| Product Model | CY-MSZ194-II-DC-SS |
| Number of Targets | 2 (dual target) |
| Target Size | 2-inch; Dia. 50.8 mm, thickness ≤ 3 mm |
| Sample Stage Diameter | φ100 mm |
| Stage Heating Temp | ≤ 500 °C |
| Stage Rotation | ≤ 20 rpm |
| Vacuum Chamber | φ194 mm stainless steel |
| Base Pressure | 1.0 × 10⁻⁴ Pa |
| Power Supply | DC 500W + optional RF |
| Supply Voltage | AC 220V / 50–60 Hz |
| Applications | Cr films, multi-material coatings, wafer deposition, SEM preparation |
| Trade Detail | Information |
|---|---|
| Minimum Order Quantity | 1 Unit |
| Supply Ability | 4 Units Per Month |
| Delivery Time | 1–16 Weeks |
| Main Domestic Market | China |
| Export Markets | Worldwide |
| Payment Terms | T/T, L/C, Western Union, PayPal |
| Packaging | Wooden crate with foam-padded export packing |
| Warranty | 12 Months from date of commissioning |
| After-Sales Service | Online technical support + on-site service available |
| Customization | Available on request |
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