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1650℃ Bridgman single crystal growth furnace for Silicon Nitride Crystal

CYSI 1650°C Bridgman single crystal growth furnace for silicon nitride, silicon, sapphire, and SiC crystal growth with controlled temperature gradient, motorised pull mechanism, and inert atmosphere capability.

SKU : CY-1650--BRIDGMAN-SINGLE-CRYSTAL-GROWTH-FUR In stock Categories : Crystal Growth Furnace

The CYSI 1650°C Bridgman Single Crystal Growth Furnace applies the Bridgman-Stockbarger method to grow high-quality single crystals of silicon nitride, silicon, sapphire, silicon carbide, and other semiconductor and functional materials. Precise temperature gradient control, a motorised pull mechanism with adjustable withdrawal rate, and inert atmosphere operation combine to produce single crystals with low dislocation density and excellent structural perfection.

Specifications

ParameterValue / Details
Maximum Temperature1650 °C
Growth MethodBridgman-Stockbarger method
Temperature Gradient ControlPrecise gradient management for crystal quality
Pull MechanismMotorised — adjustable withdrawal rate
AtmosphereInert gas (N₂/Ar) protection
Target CrystalsSi₃N₄, Si, Sapphire, SiC, functional crystals
ApplicationsSemiconductor wafer substrates, optical crystals, functional crystal research

Trade Information

Trade DetailInformation
Minimum Order Quantity1 Unit
Supply Ability4 Units Per Month
Delivery Time1–16 Weeks
Main Domestic MarketChina
Export MarketsWorldwide
Payment TermsT/T, L/C, Western Union, PayPal
PackagingWooden crate with foam-padded export packing
Warranty12 Months from date of commissioning
After-Sales ServiceOnline technical support + on-site service available
CustomizationAvailable on request

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